The AI Power Chain series · Part 3 of 6

Glossary of terms used

CDU
Coolant Distribution Unit. Thermal system component distributing chilled coolant to racks or direct-to-chip cold plates.
GPU
Graphics Processing Unit. The compute silicon at the centre of AI workloads.
SiC
Silicon Carbide. Wide-bandgap semiconductor material used in high-voltage power electronics.
ADI KUMAR · POWER & DIGITAL INFRASTRUCTUREAUGUST 2026 · V1 · ~40 MIN READ
The AI Power Chain · Part 3-A · Technical Companion
How data center thermal management works

The Thermal Stack: Technical Companion

Where the market essay named the vendors, this piece explains the physics. What ~1,000 W/cm² peak local hotspot flux means at the die, how a coupling that costs a hundred dollars either saves a rack or destroys it, why the industry is moving cooling from the room into the package, and where the technology goes next. Cross-sections, flow diagrams, and roadmaps for readers who want to understand the plumbing under the market.

Reading this piece. It is a technical companion to The Thermal Stack (Part 3 of the AI Power Chain). The market piece named the vendors, sized the layers and mapped the M&A. This one explains the underlying heat transfer, the mechanics of the interface materials and couplings, the fluid chemistry, and the roadmap items every operator now has on their qualification list. No prior thermal engineering background assumed, but the reader should know what a heatsink does at a systems level.
1The physics · What "cool" means

Heat and information measure different things

Every watt of electrical power a GPU consumes leaves the die as heat. Switching transistors obey conservation of energy; software choices change the watt budget but not the heat path. What determines whether the die throttles is how fast that heat gets to a fluid cool enough to accept it. That is a fluid mechanics and materials-science problem, and every layer in the thermal stack is a specific answer to it.

Three mechanisms move heat: conduction (through solids and stagnant fluids, described by Fourier's law q = -k·∇T), convection (through moving fluids, described by Newton's law of cooling q = h·A·ΔT), and radiation (from any surface above absolute zero; present but small relative to conduction and convection in the temperature ranges and geometries relevant to data-centre cooling). Data centre cooling is a game played almost entirely in the first two. Conduction dominates from the die to the coolant. Convection dominates from the coolant to the atmosphere.

Heat flux, in context
W/cm² at the die vs everyday reference points, log scale
A 100W incandescent bulb radiates roughly 6 W/cm² off its filament. A domestic cooktop element runs at ~15 W/cm². The sun's surface, integrated, is ~6,300 W/cm². An H100 GPU die (full-die area ~8.14 cm², ~700W) averages ~86 W/cm² across the full die. Local hotspots over sub-cm² active regions push into the 500 to 1,000 W/cm² range. Next-generation accelerators sustain peak local flux approaching 1,000 W/cm², with averaged full-die flux much lower.

Junction temperature is the master variable

Silicon devices are specified to a maximum junction temperature (T_j_max). For hyperscale AI accelerators the limit is typically in the 90°C to 110°C range and is device-specific. Automotive silicon runs higher (125°C+). SiC operates well above that (200°C+)Above T_j_max, one of three things happens: the device throttles (reduces clock frequency or blocks current), it drifts electrically (threshold voltage shifts, leakage rises), or it fails outright. The whole thermal design job is to keep T_j below T_j_max while the die dissipates its rated power.

The relationship is a simple series-resistance model. Heat flows from junction through a stack of thermal resistances (die, interface material, lid, second interface, cold plate, coolant film) into the coolant. Each layer adds a temperature drop equal to the heat flow times its thermal resistance. Add them up and you get the required coolant temperature to keep the junction cool enough.

The thermal stack, layer by layer
Heat flow from die to coolant, and where each temperature drop happens
Silicon die · Tj ≤ ~105°C
TIM 1 (die → lid)grease, PCM, sinter, and liquid metal
Integrated heat spreader (Cu lid)
TIM 2 (lid → cold plate)grease or PCM · 25-100µm bond line
Cold plateCu with skived fins or microchannels · flow through
Coolant film (convective boundary)
Bulk coolant (technology cooling water) · ~35°C
Manifold, UQD, hose → CDU
Heat exchanger inside CDU
Facility water loop · ~30°C
Facility heat rejection (dry cooler / cooling tower)
Atmosphere · wet bulb or dry bulb temperature
Each layer is a thermal resistance in series. R_total = R_die + R_TIM1 + R_lid + R_TIM2 + R_plate + R_convection + R_cdu + R_facility. Total temperature drop from junction to atmosphere is the sum of layer drops. Any layer that fails silently (e.g. TIM pump-out) shifts the whole distribution and pushes T_j toward T_j_max.
2Convection · Why liquid replaces air
In brief

CDU architecture, coolant chemistry and facility loop separation determine how efficiently heat leaves the chip package. In representative architectures single-phase glycol can support several hundred watts per die; two-phase dielectric extends the achievable range into the kilowatt-plus region. Practical limits depend on heat-flux distribution, cold-plate geometry, flow rate, inlet temperature and allowable pressure drop. Fluid degradation, secondary-loop maintenance and heat-exchanger fouling add operating cost that offsets some of the density gain.